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US 6,143,465 AGranted
Photosensitive polymer having cyclic backbone and resist composition comprising same
AssigneeSamsung Electronics Co., Ltd.
InventorSang-jun Choi
Life of this patent
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Abstract
A photosensitive polymer represented by the following formula, and a resist composition including (a) a photosensitive polymer represented by the following formula: ##STR1## where R.sub.1 is a C.sub.1 to C.sub.20 aliphatic hydrocarbon, R.sub.2 is t-butyl, tetrahydropyranyl or 1-alkoxy ethyl, 1/(1+m+n) is from 0.0 to about 0.4, m/(1+m+n) is 0.5, and n/(1+m+n) is from about 0.1 to about 0.5, and (b) a photoacid generator (PAG).
Claims20
A photosensitive polymer represented by the following formula:
- ##STR11## where R.sub.1 is selected from the group consisting of hydrogen, C.sub.1 to C.sub.20 aliphatic hydrocarbon, and C.sub.7 to C.sub.20 alicyclic hydrocarbon, R.sub.2 is selected from the group consisting of t-butyl, tetrahydropyranyl and 1-alkoxy ethyl, 1/(1+m+n) is from 0.0 to about 0.4, m/(1+m+n) is 0.5, and n/(1+m+n) is from about 0.1 to about 0.5.
A resist composition comprising:
- (a) a photosensitive polymer represented by the following formula:
- ##STR12## where R.sub.1 is selected from the group consisting of hydrogen, C.sub.1 to C.sub.20 aliphatic hydrocarbon, and C.sub.7 to C.sub.20 alicyclic hydrocarbon, R.sub.2 is selected from the group consisting of t-butyl, tetrahydropyranyl and 1-alkoxy ethyl, 1/(1+m+n) is from 0.0 to about 0.4, m/(1+m+n) is 0.5, and n/(1+m+n) is from about 0.1 to about 0.5;
- and
- (b) a photoacid generator (PAG).
1 more element
Dependencies are inferred from the claim text.