Diazodisulfone compound and radiation-sensitive resin composition
AssigneeJsr Corporation
InventorsEiichi Kobayashi, Ken-ichi Yokoyama, Yong Wang, Shin-ichiro Iwanaga
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Abstract
A novel diazodisulfone compound capable of generating acid having high sensitivity to far ultraviolet rays typified by a KrF excimer laser and the like and capable of providing a resist with superior resolution and patterns when used as a photoacid generator for a chemically amplified resist, and a radiation-sensitive resin composition comprising the diazodisulfone compound. The diazodisulfone compound is represented by the following formulas (1) and (2). ##STR1## The radiation-sensitive resin composition comprises the diazodisulfone compound and resin represented by 4-hydroxystyrene/4-(1'-ethoxyethoxy)styrene copolymer.
Claims14
A diazodisulfone compound shown by the following formula (1), ##STR25## wherein R.sup.1 is a monovalent organic group and R.sup.2 -R.sup.9 independently represent a hydrogen atom, an alkyl group having 1-4 carbon atoms, an alkoxyl group having 1-4 carbon atoms, or a hydroxyalkyl group having 1-4 carbon atoms.
A diazodisulfone compound shown by the following formula (2), ##STR26## wherein R.sup.10 is a monovalent organic group, R.sup.11 -R.sup.18 independently represent a hydrogen atom, an alkyl group having 1-4 carbon atoms, an alkoxyl group having 1-4 carbon atoms, or a hydroxyalkyl group having 1-4 carbon atoms, and R.sup.19 and R.sup.20 independently represent an alkyl group having 1-4 carbon atoms or R.sup.19 and R.sup.20 in combination represent a divalent organic group having 2-8 carbon atoms which forms a heterocyclic structure with an oxygen.
Dependencies are inferred from the claim text.