Method of reacting excess CVD gas reactant
AssigneeHowmet Research Corporation
InventorsDaniel L. Near, Bruce M. Warnes, Stephen M. Winters
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Abstract
Method and apparatus for controlling deposition from excess gaseous reactant in an exhaust conduit of a chemical vapor deposition apparatus involves introducing a gaseous chemical reactant in the exhaust stream effective to react with the excess gaseous reactant in the exhaust stream to form solid reaction product particulates in a manner that reduces harmful deposition of liquid and/or solid metal in the exhaust system.
Claims12
A method of reacting excess gaseous reactant in an exhaust stream of an exhaust conduit of a chemical vapor deposition apparatus, comprising introducing a gaseous chemical reactant to the exhaust stream so as to react with said excess gaseous reactant to form solid reaction product particulates in said exhaust stream.
A method of reacting excess gaseous aluminum halide reactant in an exhaust stream of an exhaust conduit of a chemical vapor deposition aluminizing apparatus, comprising introducing to the exhaust stream a gaseous chemical reactant that reacts with said aluminum halide reactant to form solid reaction product particulates in said exhaust stream.
Dependencies are inferred from the claim text.