Four-mirror extreme ultraviolet (EUV) lithography projection system

A system for transferring a pattern on a reticle to a substrate, the system having an optical axis, the system comprising:

• a first, concave mirror having a radius of curvature of 400 to 600 millimeters, the first mirror positioned from 400 to 600 millimeters from the substrate in a first direction along the system's optical axis;
• a second, convex mirror having a radius of curvature of 300 to 500 millimeters, the second mirror positioned from 200 to 400 millimeters from the first mirror in a second direction along the system's optical axis, the second direction opposite to the first direction;
• a third, concave mirror having a radius of curvature of 900 to 1400 millimeters, the third mirror positioned from 400 to 600 millimeters from the second mirror in the first direction along the system's optical axis;
• and
• a fourth, convex mirror having a radius of curvature of 2000 to 6000 millimeters, the fourth mirror positioned from 500 to 800 millimeters from the third mirror in the second direction along the system's optical axis, and the distance from the fourth mirror to the reticle in a range from 800 to 1500 millimeters in the first direction;
• wherein the first, second, third and fourth mirrors are decentered between the values of 1 to 5, 0 to -2, 2 to 7, and 1 to 4 millimeters, respectively, along an axis normal to the system's optical axis.

A system for transferring a pattern on a reticle to a substrate, the system having an optical axis, the system comprising:

• a first, concave mirror having a radius of curvature of 400 to 600 millimeters, the first mirror positioned from 400 to 600 millimeters from the substrate in a first direction along the system's optical axis;
• a second, convex mirror having a radius of curvature of 300 to 500 millimeters, the second mirror positioned from 200 to 400 millimeters from the first mirror in a second direction along the system's optical axis, the second direction opposite to the first direction;
• a third, concave mirror having a radius of curvature of 900 to 1400 millimeters, the third mirror positioned from 400 to 600 millimeters from the second mirror in the first direction along the system's optical axis;
• and
• a fourth, convex mirror having a radius of curvature of 2000 to 6000 millimeters, the fourth mirror positioned from 500 to 800 millimeters from the third mirror in the second direction along the system's optical axis, and the distance from the fourth mirror to the reticle in a range from 800 to 1500 millimeters in the first direction;
• wherein the object field at the reticle is decentered between the values of 200 to 250 millimeters along an axis normal to the optical axis.

A system for transferring a pattern on a reticle to a substrate, the system having an optical axis, the system comprising:

• a first, concave mirror having a radius of curvature of 400 to 600 millimeters, the first mirror positioned from 400 to 600 millimeters from the substrate in a first direction along the system's optical axis;
• a second, convex mirror having a radius of curvature of 300 to 500 millimeters, the second mirror positioned from 200 to 400 millimeters from the first mirror in a second direction along the system's optical axis, the second direction opposite to the first direction;
• a third, concave mirror having a radius of curvature of 900 to 1400 millimeters, the third mirror positioned from 400 to 600 millimeters from the second mirror in the first direction along the system's optical axis;
• and
• a fourth, convex mirror having a radius of curvature of 2000 to 6000 millimeters, the fourth mirror positioned from 500 to 800 millimeters from the third mirror in the second direction along the system's optical axis, and the distance from the fourth mirror to the reticle in a range from 800 to 1500 millimeters in the first direction;
• wherein the first, second, third and fourth mirrors are tilted between the values of 0 to 1, 0 to -1, 0 to 1, 0 to -1 degrees, respectively, about an axis orthogonal to the optical axis.

A system for transferring a pattern on a reticle to a substrate, the system having an optical axis, the system comprising:

• a first, concave mirror having a radius of curvature of 400 to 600 millimeters, the first mirror positioned from 400 to 600 millimeters from the substrate in a first direction along the system's optical axis;
• a second, convex mirror having a radius of curvature of 300 to 500 millimeters, the second mirror positioned from 200 to 400 millimeters from the first mirror in a second direction along the system's optical axis, the second direction opposite to the first direction;
• a third, concave mirror having a radius of curvature of 900 to 1400 millimeters, the third mirror positioned from 400 to 600 millimeters from the second mirror in the first direction along the system's optical axis;
• and
• a fourth, convex mirror having a radius of curvature of 2000 to 6000 millimeters, the fourth mirror positioned from 500 to 800 millimeters from the third mirror in the second direction along the system's optical axis, and the distance from the fourth mirror to the reticle in a range from 800 to 1500 millimeters in the first direction;
• wherein the reticle is tilted between the values of 0 to -1 degrees relative to an axis normal to the optical axis.

A system for projecting patterned light from a reticle to a substrate, the system comprising:

• a dominantly hyperbolic convex mirror;
• a dominantly elliptical concave mirror;
• a dominantly spherical convex mirror;
• and
• a dominantly spherical concave mirror,
• the mirrors, in the stated sequence, for transferring patterned light from the reticle, through said system of mirrors, to the substrate.