ArF photoresist copolymers
AssigneeHyundai Electronics Industries Co., Ltd.
InventorsJae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
Life of this patent
Estimating the term…
Abstract
A photoresist including a copolymer prepared from bicycloalkene derivative, maleic anhydride and/or vinylene carbonate, which has molecular weight ranging from about 3,000 to 100,000. The photoresist can be used for submicrolithography employing deep ultra violety as a light source. In addition to being of high etch resistance and thermal resistance, the photoresist has good adhesiveness and can be developed in a TMAH solution.
Claims40
A photoresist copolymer which is polymerized from one or more carboxy-substituted bicycloalkenes of the following formula II, and maleic anhydride of the following formula III or a vinylene carbonate of the following formula IV:
- ##STR7## wherein R represents hydrogen or a straight or branched alkyl containing 1-10 substituted or non-substituted carbon atoms, R of one of said bicycloalkenes being hydroxyalkyl;
- and n is 1 or 2 ##STR8##
A photoresist, which comprises a copolymer having repeating units derived from one or more carboxy-substituted bicycloalkenes of the following formula II, and maleic anhydride of the following formula III or vinylene carbonate of the following formula IV:
- ##STR9## wherein R represents hydrogen or a straight or branched alkyl containing 1-10 substituted or non-substituted carbon atoms, R of one of said bicycloalkenes being hydroxalkyl;
- and n is 1 or 2, ##STR10##
A photoresist copolymer which comprises 2-hydroxyethyl 5-norbornene-2-carboxylate polymerized with the following monomers:
- ##STR11##
A semiconductor device comprising:
- a substrate;
- and
- a film comprising a photoresist copolymer which is polymerized from one or more carboxy-substituted bicycloalkenes of the following formula II, and maleic anhydride of the following formula III or vinylene carbonate of the following formula IV, said film overlying said substrate ##STR12## wherein R represents hydrogen or a straight or branched alkyl containing 1-10 substituted or non-substituted carbon atoms, R of one of said bicycloalkenes being hydroxyalkyl;
- and n is 1 or 2 ##STR13##
Dependencies are inferred from the claim text.