Substrate transfer system for semiconductor processing equipment

An apparatus comprising:

• a substrate processing chamber;
• a susceptor in said chamber for horizontally supporting a substrate within the chamber, said susceptor being formed of a central section and a surrounding annular section which supports the inner section, said sections being configured to mate together to form a susceptor unit having an upper surface for receiving a substrate;
• and
• one or more supports for said susceptor sections for supporting the susceptor in a process position and for producing relative vertical movement between the sections so that said central section is in a substrate load and unload position to have a substrate transferred to and from a tool and the central susceptor section, said supports including a multi-armed support for supporting and rotating said annular section and a second support for raising said central section to facilitate transfer of a substrate from the tool to the central section.

A method of loading and unloading a substrate from a susceptor in a chamber comprising the steps of:

• supporting an outer susceptor section with an outer support while supporting a central susceptor section with said outer section;
• producing relative vertical movement between said central susceptor section and said outer susceptor section so that the inner section is spaced above the outer section on a moveable support;
• moving a substrate with a tool into position spaced above said central susceptor section;
• providing relative vertical movement between said central section and said tool to transfer the substrate to the central section with portions of the substrate overlapping the central section;
• withdrawing the robotic arm from above the susceptor;
• producing relative vertical movement between said susceptor sections so as to cause the central section to fit within and be supported by the outer susceptor section forming a susceptor unit for supporting said substrate.