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US 6,034,411 AGranted
Inverted thin film resistor
AssigneeIntersil Corporation
InventorsWilliam R. Wade, Jack Linn
Life of this patent
Estimating the term…
Abstract
An integrated circuit inverted thin film resistor structure and method of manufacture having interconnect defining resistor contacts and leads resident within and coplanar with a supporting layer, resistive material uniformly overlaying the supporting layer and contacts, the resistive material diffused into the resistor/interconnect contact region.
Claims8
An integrated circuit inverted thin film resistor structure comprising:
- interconnect material defining a resistor contact and lead resident within a supporting layer, the resistor contact being exposed at the supporting layer surface and having a height not exceeding the supporting layer surface;
- a film of resistive material having a thickness of 10-30 nm overlaying at least a portion of the supporting layer and the contact, the thickness of the resistive film over the contact being at least as thick as the thickness of the resistive film over the supporting layer;
- and
- a junction region providing a conductive path from the resistive film to the resistor contact and lead, the junction region being defined by a region surrounding the interface between the contact and resistive film, and having an intermixture of interconnect material and resistive material.
1 more element
An integrated inverted thin film resistor made by a process comprising the steps of:
- (a) providing a supporting layer of an insulating material having a substantially planar upper surface;
- (b) trenching through the upper surface of the supporting layer to form a trench having a predetermined shape;
- (c) providing a member for conducting electricity, said member comprising a contact material and having the predetermined shape with a substantially planar top surface;
- (d) positioning the member in the trench with the top surface thereof having a height not exceeding the upper surface of the supporting layer;
- (e) providing a film having a thickness of 10-30 nm of a resistive material over at least a portion of the supporting layer and over at least a portion of said member, the resistive film over the member being at least as thick as the resistive film over the supporting layer;
- and
- (f) treating the junction of the member and the resistive film to provide an intermixture of resistive material and interconnect material, said junction providing a conductive path between the resistive film and the member.
4 more elements
An integrated inverted thin film resistor comprising:
- a resistor contact of a contact material and having an elongated block shape with substantially planar surfaces including a top surface;
- a supporting layer of an insulating material having:
- (i) a planarized upper surface, and
- (ii) a trench with an opening through said planarized upper surface shaped to receive said contact,
- said supporting layer being in a supporting relationship to said contact and the top surface of said contact not exceeding the upper surface of the said supporting layer;
- a film of a resistive material having a thickness of 10-30 nm overlaying at least a portion of said supporting layer and at least a portion of said contact, said resistive film over said contact being at least as thick as said resistive film over said supporting layer;
- and
- a junction region providing a conductive path between said resistive film and said contact, said junction region being defined by a region surrounding the interface between the top surface of said contact and said resistive film, said junction region having an intermixture of resistive material and interconnect material.
5 more elements
Dependencies are inferred from the claim text.