Photomask arrangement protecting reticle patterns from electrostatic discharge damage (ESD)
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsShih-Shiung Chen, Ming-Fa Chen, Ho-Ku Lan, Ying-Chen Chao
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Abstract
A photomask arrangement is disclosed to prevent the reticle patterns of a photomask from peeling caused by electrostatic discharge damage. The photomask includes: a substrate; a plurality of metal shielding layers formed on the surface of the substrate to provide the reticle patterns, wherein each two of the metal shielding layers are spaced apart by a clear scribe line; and a plurality of metal lines formed on the clear scribe line to connect the adjacent metal shielding layers, thereby increasing the effective surface area of the reticle patterns.
Claims7
A photomask having reticle patterns protected from electrostatic discharge damage (ESD), comprising:
- a substrate;
- a plurality of metal shielding layers formed on the surface of said substrate to provide the reticle patterns, wherein pairs of said metal shielding layers are spaced apart by a clear scribe line;
- and
- a plurality of metal lines formed on said clear scribe line to connect the adjacent metal shielding layers, thereby increasing the effective surface area of the reticle patterns.
Dependencies are inferred from the claim text.