Sram cell employing substantially vertically elongated pull-up resistors
AssigneeMicron Technology, Inc.
InventorCeredig Roberts
Life of this patent
Estimating the term…
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AssigneeMicron Technology, Inc.
InventorCeredig Roberts
Estimating the term…
An SRAM cell having at least four field effect transistors includes, a) at least four transistor gates, a ground line, a Vcc line, and a pair of pull-up resistors; the four transistor gates having associated transistor diffusion regions operatively adjacent thereto; and b) the Vcc line and the ground line being provided in different respective elevational planes, the pull-up resistors being substantially vertically elongated between Vcc and selected of the respective transistor diffusion regions operatively adjacent the gates. In an additional aspect, an SRAM cell having at least four field effect transistors includes, i) at least four transistor gates, an electrical interconnect line, a Vcc line, and a pair of pull-up resistors; the four transistor gates having associated transistor diffusion regions operatively adjacent thereto; and ii) the Vcc line and the electrical interconnect line being provided in different respective elevational planes, the pull-up resistors being substantially vertically elongated between Vcc and selected of the respective transistor diffusion regions operatively adjacent the gates.
An SRAM cell having at least four field effect transistors, the SRAM cell comprising:
An SRAM cell having at least four field effect transistors, the SRAM cell comprising:
An SRAM cell having at least four field effect transistors, the SRAM cell comprising:
An SRAM cell having at least four field effect transistors, the SRAM cell comprising:
Dependencies are inferred from the claim text.