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US 5,969,799 AGranted
Exposure apparatus with a pulsed laser
AssigneeCanon Kabushiki Kaisha
InventorNaoto Sano
Life of this patent
Estimating the term…
Abstract
An exposure apparatus comprising (a) irradiating means for illuminating a mask with laser light from an excimer laser and (b) a projection optical system for projecting a pattern of the mask onto a substrate with the laser light, wherein a characteristic of the projection optical system is measured by use of a harmonic of a predetermined laser, and wherein the laser light from the excimer laser has a wavelength corresponding to that of the harmonic of the predetermined laser.
Claims15
An exposure apparatus comprising:
- means for illuminating a mask with light from an excimer laser;
- and
- a projection optical system for projecting a pattern of the mask onto a substrate with the light from the excimer laser,
- wherein optical performance of said projection optical system is measured by forming an interference fringe, containing information related to aberration of said projection optical system, by use of a secondary harmonic wave of a laser separate from said excimer laser, and then by analyzing the interference fringe, and
- wherein the light from the excimer laser has a wavelength corresponding to that of the harmonic of the laser separate from the excimer laser.
2 more elements
An exposure apparatus comprising:
- illuminating means for illuminating a mask with light from a KrF excimer laser;
- and
- a projection optical system for projecting a pattern of the mask onto a substrate with the light from the excimer laser,
- wherein optical performance of said projection optical system is measured by forming an interference fringe, containing information related to aberration of said projection optical system, by use of a secondary harmonic wave of an Argon laser, and then by analyzing the interference fringe, and
- wherein the light from the KrF excimer laser has a wavelength corresponding to that of the secondary harmonic of the Argon laser.
2 more elements
An exposure apparatus, comprising:
- illuminating means for illuminating a mask with light from a first laser;
- and
- a projection optical system for projecting a pattern of the mask onto a substrate with the light from the first laser,
- wherein optical performance of said projection optical system is measured by forming an interference fringe, containing information related to aberration of said projection optical system, by use of light from a second laser having higher coherency than said first laser, and then by analyzing the interference fringe, and
- wherein the wavelength of the light from the first laser is registered with that of the harmonic of the second laser.
2 more elements
Dependencies are inferred from the claim text.