Peel-apart photosensitive elements and their process of use
AssigneeE. U. du Pont de Nemours and Company
InventorsHarvey Walter Taylor, Jr., Gregory Charles Weed
Life of this patent
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Abstract
An element containing, in order: a first strippable substrate; a substantially transparent, non-photosensitive, polymeric isolation layer having a coating weight of 10 to 150 mg/dm.sup.2 ; an essentially non-photosensitive, non-tacky organic layer having a coating weight of 25 to 200 mg/dm.sup.2 ; a pigmented photosensitive, preferably photopolymerizable layer; and a second different strippable substrate adjacent the photosensitive layer, wherein the photosensitive layer upon imagewise exposure to actinic radiation exhibits a lowered peel force relative to a system which does not have a polymeric isolation layer.
Claims12
An element comprising, in order:
- (a) a first strippable substrate;
- (b) a substantially transparent, non-photosensitive, polymeric isolation layer having a coating weight of 10 to 100 mg/dm.sup.2 ;
- (c) an essentially non-photosensitive, non-tacky organic layer having a coating weight of 25 to 200 mg/dm.sup.2 and comprising of at least one polymer selected from:
- (i) structured, block or random polymers prepared from at least one aromatic monomer and at least one monomer selected from olefin such as ethylene, propylene, butylene, isobutylene, butene, 1,4-hexadiene, and vinyl acetal;
- and
- (ii) reaction products of random polymers prepared from at least one aromatic monomer and at least one monomer selected from ethylene, propylene, and butylene with 2-butenedioic acid or cyclic anhydrides, wherein the organic layer is soluble in a solvent containing at least 90% toluene;
- (d) a pigmented photosensitive layer;
- and
- (e) a second strippable substrate adjacent the photosensitive layer;
- wherein the photosensitive layer exhibits increased adhesion to the second strippable substrate during removal of the first strippable substrate.
Dependencies are inferred from the claim text.