Method of controlling exposure

A method of illuminating with exposure illumination light under which the pattern of a mask is transferred onto a photosensitive substrate, said method comprising:

• receiving a luminous flux separated from said illumination light and outputting a signal of the luminous flux;
• calculating an exposure quantity of said illumination light on said substrate based on said signal of the luminous flux;
• and
• storing correlation values for computing the exposure quantity on said substrate from said signal, said correlation values corresponding to each of a plurality of illumination conditions in said exposure illumination light, wherein a correlation function is:
• I=.alpha.(I)E
• wherein I is said signal of the luminous flux, .alpha.(I) is a high-order function which corresponds to the illumination condition, and E is an exposure energy on said photosensitive substrate.

A method of illuminating with exposure illumination light under which the pattern of said mask is transferred onto a photosensitive substrate, said method comprising:

• receiving a luminous flux separated from said illumination light and outputting a signal of the luminous flux;
• calculating an exposure quantity of said illumination light on said substrate based on said signal of the luminous flux;
• and
• storing correlation coefficients or correlation maps for computing the exposure quantity on said substrate from said signal, said correlation coefficients or correlation maps corresponding to each of a plurality of illumination conditions in said exposure illumination light, wherein a correlation function is:
• I=.alpha.(I)E
• wherein I is said signal of the luminous flux, .alpha.(I) is a high-order function which corresponds to the illumination condition, and E is an exposure energy on said photosensitive substrate.

An exposure method for exposing a substrate by illuminating a pattern of a mask with exposure light and projecting an image of said pattern onto said substrate via a projection optical system, said method comprising the steps of:

• obtaining first exposure quantity control data by using a reference illuminance meter to detect energy of said exposure light on an image surface side of said projection optical system under a first illumination condition;
• obtaining a first signal outputted from a photodetector disposed on a stage for holding said substrate when energy of said exposure light is detected by said photodetector under the first illumination condition;
• obtaining a second signal outputted from said photodetector when the energy of said exposure light is detected by said photodetector under a second illumination condition differing from the first illumination condition;
• and
• obtaining second exposure quantity control data under the second illumination condition on the basis of said first exposure quantity control data, said first signal and said second signal.