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US 5,965,302 AGranted
Method for producing mask ROM and photomask used therefor
AssigneeSharp Kabushiki Kaisha
InventorsYoshiyuki Horikawa, Kenji Shimizu
Life of this patent
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Abstract
According to the present invention, a photomask for providing a pattern to a resist applied on a substrate is provided. The photomask includes a light blocking region forming a boundary between a first region and a second region on the substrate. A width of the light blocking region is such that the light blocking region is not projected on the resist.
Claims12
A photomask for providing a pattern to a resist applied on a substrate, the photomask comprising:
- a light blocking region forming a boundary between a first region and a second region on the substrate, wherein
- a width of the light blocking region is such that the light blocking region is not projected on the resist when the resist is irradiated through the photomask.
A method for producing a photomask for providing a pattern to a resist applied on a substrate, the method comprising the step of:
- forming a light blocking region which forms a boundary on the substrate between a first region and a second region, wherein
- a width of the light blocking region is such that the light blocking region is not projected on the resist when the resist is irradiated through the photomask.
Dependencies are inferred from the claim text.