Method of forming a capacitor and a capacitor construction
AssigneeMicron Technology, Inc.
InventorsMark Fischer, Mark Jost, Kunal Parekh
Life of this patent
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AssigneeMicron Technology, Inc.
InventorsMark Fischer, Mark Jost, Kunal Parekh
Estimating the term…
The invention encompasses capacitor constructions. In one aspect, the invention includes a stacked capacitor construction comprising: a) a substrate; b) an electrically conductive runner provided on the substrate, the runner having an outer conductive surface; c) a node on the substrate adjacent the electrically conductive runner; d) an electrically conductive pillar in electrical connection with the node, the pillar projecting outwardly relative to the node adjacent the conductive runner, the pillar having an outer surface; e) an electrically conductive storage node container layer in electrical connection with the pillar; f) a capacitor dielectric layer over the capacitor storage node layer; and g) an electrically conductive outer capacitor plate over the capacitor dielectric layer; and h) the pillar outer surface being elevationally inward of the runner outer surface.
A stacked capacitor construction, comprising:
Dependencies are inferred from the claim text.