Lithographic process and energy-sensitive material for use therein

A process for device fabrication comprising:

• forming a layer of energy sensitive material on a substrate, wherein the energy sensitive resist material contains a blend of polymers with three substituent groups, a first substituent group, a second substituent group, and a third substituent group pendant thereto wherein the first substituent is an hydroxyl group (OH), the third is a substituent group. RCOO--, that hydrogen bonds with the first (OH) substituent, wherein at least a portion of the first substituents are pendant on a first polymer in the blend and at least a portion of the third substituents are pendant on a second polymer in the blend, and the second substituent is an acid labile group, wherein R is selected from the group consisting of alkyl moieties having at least one but no more than about eight carbon atoms, cycloalkyl moieties having no more than about eight carbon atoms, substituted benzyl and phenyl moieties wherein the substituent groups on the benzyl and phenyl moieties are selected from the group consisting of alkyl groups with eight or less carbon atoms, halo groups, and oxygenated alkyls wherein the total number of carbons is eight or less and wherein the relative amount of the first and second substituents are selected so that the glass transition temperature (T.sub.g) of the energy sensitive resist composition, both prior to and after exposure to radiation in the wavelength range of about 220 nm to about 365 nm, is greater than a post-exposure baking temperature and wherein at least 20 mole percent of the substituent groups on the polymer are acid labile substituent groups;
• exposing the energy sensitive resist material to patterned radiation in the wavelength range of about 220 nm to about 365 nm, thereby introducing an image of the pattern into the energy sensitive resist material;
• baking the resist at a post-exposure baking temperature of about 60.degree. C. to about 130.degree. C.;
• developing the image into a pattern;
• and
• transferring the pattern into the underlying substrate.