Radiation-sensitive resin composition

A radiation-sensitive resin composition comprising:

• (i) an alkali-soluble resin;
• (ii) a phenol compound represented by the following formula (1):
• ##STR15## wherein R.sub.1 to R.sub.4 are the same or different and each represent a halogen atom, an alkyl group, an alkoxyl group, an aryl group, a nitro group, a cyano group, a hydroxyalkyl group, a hydroxyalkoxyl group or a hydroxyl group;
• a, b, c and d independently represent an integer of 0 to 4 and satisfying 0.ltoreq.a+b.ltoreq.4 and 0.ltoreq.c+d.ltoreq.4, provided that when a+b is 1 and at least one of R.sub.1 or R.sub.2 and R.sub.3 or R.sub.4 to be present is an alkyl group, a hydroxyalkyl group or a hydroxyalkoxyl group;
• R.sub.5 to R.sub.10 are the same or different and each represent a hydrogen atom, an alkyl group or an aryl group;
• and X.sub.1 and X.sub.2 are the same or different and each represent an oxygen atom or a sulfur atom, provided that when both X.sub.1 and X.sub.2 are oxygen, a+b or c+d is at least 1 and at least one of R.sub.1 and R.sub.2 is a hydroxyalkyl or a hydroxyalkoxyl group;
• and
• (iii) a 1,2-quinonediazide compound.