Lithographic proximity correction through subset feature modification

A method for modifying a design including a plurality of layers, the method comprising:

• receiving an initial design representation including a plurality of layers;
• filtering the initial design representation using a first set of predetermined criteria to form a filtered design representation;
• applying a set of lithographic proximity shapes associated with a first set of shapes in the filtered design representation;
• selecting a second set of shapes in the filtered design representation;
• modifying a subset of the lithographic proximity shapes in the first set of shapes based on the relationship of the lithographic proximity shapes to the second set of shapes to form a modified filtered design representation;
• and forming a modified design using said modified filtered design representation.