Method and apparatus for gettering fluorine from chamber material surfaces

A method for removing residues from an interior surface of a processing chamber, said method comprising the steps of:

• introducing fluorine from a first cleaning gas into said processing chamber during a first time period, wherein said first introducing step cleans the residues from an interior surface of said processing chamber;
• introducing a second cleaning gas into said processing chamber during a second time period to form clean reactants by a heat-induced chemical reaction between said fluorine and material from said second cleaning gas without in situ plasma excitation;
• maintaining a temperature of greater than about 550.degree. C. and less than about 600.degree. C. with a heater in said processing chamber during said first and second introducing steps;
• and
• evacuating said residues from said processing chamber during said first time period and said clean reactants during said second time period.