Method and apparatus for drying substrates

An apparatus for removing residual liquid on a substrate surface, the apparatus comprising:

• (a) a reservoir for containing fluid having a fluid surface level;
• (b) a vapor distributor for maintaining a partial pressure of vapor over the fluid surface level;
• (c) a fluid dispenser for dispensing fresh fluid into the reservoir;
• (d) first means for lowering the fluid surface level through a range of levels;
• and
• (e) second means for contacting and holding the substrate at different holding points on the substrate and withdrawing contact from the substrate at one or more of the holding points as the fluid surface level is lowered so that the fluid surface level does not pass across a holding point that is being used to hold the substrate.

A drying chamber for drying substrates having residual liquid thereon, the drying chamber comprising:

• (a) a fluid system comprising a reservoir for containing fluid having a fluid surface level and a fluid dispenser for introducing fluid into the reservoir;
• (b) a vapor distributor for supplying a vapor above the fluid surface level;
• (c) first means for lowering-the fluid surface level in the reservoir to cause residual liquid to flow off the substrates;
• and
• (d) second means for contacting and holding the substrate at different holding points on the substrate, and withdrawing contact at one or more of the holding points as the residual liquid flows off the substrate.