Method of manufacturing liquid crystal display device

Abstract

A method of manufacturing a liquid crystal display device, which comprises the steps of forming an amorphous silicon layer on a substrate, and irradiating, by way of scanning, a linear energy beam onto the amorphous silicon layer, thereby converting an irradiated portion of the an amorphous silicon layer into a polycrystalline silicon layer. The irradiation and scanning of the linear energy beam are performed plural times while shifting the scanning of the linear energy beam so as to allow the irradiation of the linear energy beam to cover every region of the amorphous silicon layer that is desired to be converted into a polycrystalline silicon layer. The scanning of linear energy beam is performed in such a manner that an edge portion of one irradiated region is overlapped by an edge portion of the next neighboring irradiated region in a plurality times of scanning of the linear energy beam thereby forming an overlapped region, and that a boundary to be formed between the overlapped region and non-overlapped region becomes non-linear in shape.

Dependencies are inferred from the claim text.