Substrate holder and reaction apparatus
AssigneesSemiconductor Process Co., Ltd., Canon Sales Co., Inc., Alcan-Tech Co., Inc.
InventorsKazuo Maeda, Kouichi Ohira, Yuhko Nishimoto
Life of this patent
Estimating the term…
Abstract
The present invention relates to a reaction apparatus for receiving a reaction gas and for heating a substrate so as to form a film such as an insulating film on the substrate or for etching, with reduced power consumption for heating the substrate. The apparatus can change a substrate temperature within a short period of time, and maintains throughput while reducing labor and cost for maintenance. The apparatus includes a substrate holder (12) with a base of an insulating material in which an electrode (22) and a heater (23) for heating the held substrate (20) are contained. The apparatus also includes a processing chamber (7) enclosed by a chamber wall (7a).
Claims16
A reaction apparatus comprising:
- a chamber wall enclosing a processing chamber for processing a solid substrate with a gas;
- heating means for heating said substrate;
- an electrode for electrostatically attracting the substrate;
- a substrate holder mounted within the processing chamber for releasibly holding the substrate, said substrate holder including one base element, said heating means and said electrode being within said one base element;
- and
- axially overlapping upper and lower protective walls mounted between said chamber wall and said substrate holder, said upper and lower protective walls being independently movable.
A reaction apparatus comprising:
- a chamber wall enclosing a processing chamber for processing a solid substrate with a gas;
- heating means for heating said substrate;
- an electrode for electrostatically attracting the substrate;
- a substrate holder mounted within the processing chamber for releasibly holding the substrate, said substrate holder including one base element, said heating means and said electrode being within said one base element;
- and
- elevating means for raising and lowering said chamber wall, said elevating means including:
- a threaded support shaft supporting said chamber wall;
- a support base including a threaded hole through which said support shaft extends for up and down movement relative thereto, as said support shaft is rotated;
- and
- drive means for rotating said support shaft.
A reaction apparatus comprising:
- a chamber wall enclosing a processing chamber for processing a solid substrate with a gas;
- a substrate holder mounted within the processing chamber for releasibly holding the substrate;
- and
- axially overlapping upper and lower protective walls mounted between said chamber wall and said substrate holder for protecting an interior surface of said chamber wall against adhesion of products of reaction of the gas, said upper and lower protective walls being independently movable.
A reaction apparatus comprising:
- a chamber wall enclosing a processing chamber for processing a solid substrate with a gas;
- a substrate holder mounted within the processing chamber for releasibly holding the substrate;
- a protective wall interposed between said chamber wall and said substrate holder for protecting an interior surface of said chamber wall against adhesion of products of reaction of the gas;
- and
- elevating means for raising and lowering said chamber wall, said elevating means including:
- a threaded support shaft supporting said chamber wall;
- a support base with a threaded hole in which said support shaft is threadably engaged, said support shaft moving relative to said support base as it is rotated;
- and
- drive means for rotating said support shaft.
Dependencies are inferred from the claim text.