Negative working photoresist composition based on polyimide primers

Negatively operating photoresist composition containing:

• a) a polyimide primer containing recurring structural units of formula (I) ##STR27## in which A.sub.1 stands for an oxygen atom or an NH group,
• R.sub.1 represents the same or different residues with a photopolymerizable olefin double bond,
• ›X! indicates the residue of the cyclic dianhydride of the same or different tetracarboxylic acids remaining after removal of the anhydride groups, and
• Y indicates the residue of the same or different diamines remaining after removal of the amino groups, as well as
• b) a photoinitiator for polymerizing olefin double bonds, which is further characterized as containing at least one other component,
• c) which is selected from the group consisting of
• c1) organosilicon compounds with one or more hydroxyl groups,
• c2) compounds of formula (IIa) ##STR28## in which A.sub.2 and
• A.sub.3, independent of one another, stand for an oxygen atom or a NR group, in which R indicates a hydrogen atom or a C.sub.1 -C.sub.4 alkyl group, and
• ›G! stands for a divalent aliphatic or aromatic group, which is unsubstituted or has one or more hydroxyl substituents,
• R.sub.2 indicates an aryl residue, which has one or more acid substituents that improve the solubility of the photoresist composition in aqueous-alkaline media,
• R.sub.3 represents a residue with at least one photopolymerizable olefin double bond, and
• y as well as
• z, independent of one another, indicate the number 0 or 1, and
• c4) mixtures consisting of two or more components selected from components of c1), c2), and c3), wherein c3) is compounds of formula (IIb) ##STR29## in which R.sub.0 represents the same or different residues with a photopolymerizable olefin double bond, and
• ›M! represents the residue of the cyclic dianhydride of a tetracarboxylic acid remaining after removal of the anhydride groups.