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US 5,856,054 AGranted
Method of alignment in exposure step through array error and shot error determinations
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorYoshikatu Tomimatu
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Abstract
A method of alignment which can reduce a rotation error and a magnifying rate error of a shot is provided. According to the method of alignment, alignment in the third step (step D) is performed through correction by determining the shot error based on data in X and Y directions in the first step (step B), as well as through correction by determining the array error based on at least one of the data of the alignment marks in X and Y directions in the second step (step C).
Claims4
In a sequential process of forming layers on a substrate, a method of alignment, comprising the steps of:
- a first step of forming a first patterned layer on said substrate, said first patterned layer having first alignment marks respectively arranged in X and Y directions in orthogonal XY axes;
- a second step of forming a second patterned layer aligned on said first patterned layer, said second patterned layer having second alignment marks respectively arranged in said X and Y axes directions, said second step comprising determining an array error and a shot error based on the first alignment marks;
- and
- a third step of forming a third patterned layer aligned on said second patterned layer, said third step comprising calculating shot error based on the first alignment marks in both of said X and Y directions formed in said first step, and calculating array error based on at least one direction of the second alignment marks in said X and Y axes directions formed in said second step.
1 more element
Dependencies are inferred from the claim text.