Process for manufacturing a microelectronic component arrangement comprising a functional layer which contains a microelectronic component, and an electrically insulating layer, said arrangement having a self supporting metal plate, an insulating layer deposited on the self-supporting metal plate, by means of at least one of chemical vapor deposition from a gas phase, and electrolytically, and an electrically insulating layer which is a good conductor of heat arranged between the metal plate and the functional layer, said insulating layer contacting and adhering directly to the metal plate and with the functional layer, said process comprising the steps of:
- providing a self-supporting metal plate as a metallic layer;
- applying to the metal plate an at least largely monocrystalline information layer which covers at least an area of the metal plate;
- applying a polycrystalline diamond insulating layer at least to regions of the surface of the metal plate which are outside of the at least one area covered by the information layer, at least regions of a surface of the information layer being left free;
- and
- depositing a functional layer which is free of diamond and free of diamond-like carbon directly on the diamond layer and on the free information layer, by means of epitaxial deposition according to crystal information from the information layer;
- wherein
- the microelectronic component is applied via the functional layer;
- and
- a component root of the microelectronic component, comprising a surface covered by the microelectronic component on at least the functional layer, is arranged at least in regions above at least one of the functional layer and the insulating layer, which regions are free of the information layer.