Method for developing treatment
AssigneeTokyo Electron Limited
InventorNorio Semba
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Abstract
The present invention provides a method for developing treatment, in which a developing solution is supplied to an object to be treated for performing a developing treatment, comprising the steps of supplying pure water onto a surface of said treating object for forming a pure water film on the surface of the treating object, and supplying a developing solution onto the surface of the treating object having the pure water film formed thereon in the preceding step. The particular method of the present invention permits markedly suppressing a defective development.
Claims18
A method for developing treatment in which a developing solution is supplied to an object to be treated for performing a developing treatment, using developing treatment apparatus comprising a nozzle for supplying said treatment solution and a pure water to said object to be treated, nozzle moving means for moving said nozzle between a first position as a starting point and a second position for supplying said treatment solution and said pure water to said object to be treated, treatment solution supply means for supplying said treatment solution to said nozzle, pure water supply means for supplying said pure water to said nozzle and control means for controlling the operation of said nozzle moving means, said treatment solution supply means and said pure water supply means, comprising the steps of:
- said control means making said nozzle moving means move said nozzle from a first position to a second position in WAIT mode;
- said control means changing a control mode of said nozzle from a WAIT mode to a NON-WAIT mode;
- said control means making said pure water supply means supply said pure water to said nozzle to supply pure water from said nozzle onto the surface of said object to be treated so as to form a liquid film of a pure water on the surface of said object to be treated;
- and
- said control means making said treatment solution supply means supply said treatment solution to said nozzle to supply said treatment solution from said nozzle.
A method for developing treatment in which a developing solution is supplied to an object to be treated for performing a developing treatment using a developing treatment apparatus comprising a nozzle for supplying said treatment solution and a pure water to an object to be treated, nozzle moving means for moving said nozzle between a first position as a starting point and a second position for supplying said treatment solution and said pure water to said object to be treated, treatment solution supply means for supplying said treatment solution to said nozzle, pure water supply means for supplying said pure water to said nozzle and control means for controlling the operation of said nozzle moving means, said treatment solution supply means and said pure water supply means, comprising the steps of:
- said control means making said nozzle moving means move said nozzle from a first position to a second position in WAIT mode;
- said control means changing a control mode of said nozzle from a WAIT mode to a NON-WAIT mode;
- said control means making said pure water supply means supply said pure water to said nozzle to supply pure water from said nozzle onto the surface of said object to be treated so as to form a curtain of a pure water between the surface of said object to be treated and said nozzle;
- and
- said control means making said treatment solution supply means supply said treatment solution to said nozzle to supply said treatment solution from said nozzle.
A method for developing treatment, in which a developing solution is supplied to a substrate coated with a resist film exposed to light to form a pattern for performing a developing treatment, comprising;
- (a) providing a common nozzle for supplying a developing solution and pure water and positioning said common nozzle in the vicinity of a substrate;
- (b) rotating said substrate on an axis thereof;
- (c) supplying pure water from said common nozzle onto the substrate to form a curtain of pure water joining said resist film to the common nozzle;
- and
- (d) introducing a developing solution into said curtain of pure water to bring said developing solution into contact with the resist film covered with pure water.
Dependencies are inferred from the claim text.