Method of making an aluminum contact
AssigneesSiemens Aktiengesellschaft, International Business Machines Corporation
InventorsMark A. Jaso, Herbert Palm, Hans Werner Poetzlberger
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Abstract
A method of forming aluminum contacts of submicron dimensions wherein, after formation of both vias and line openings in a silicon oxide layer, a metal stop layer is deposited, followed by deposition of aluminum. Alternatively, the metal stop layer is deposited prior to forming the vias and line openings. The excess aluminum is removed by chemical-mechanical polishing, the stop layer providing high selectivity to the chemical mechanical polishing. The stop layer is then removed. The resultant silicon oxide-aluminum surface is planar and undamaged by the chemical-mechanical polishing step.
Claims11
A method of forming aluminum contacts in an integrated circuit comprising:
- a) providing a silicon dioxide layer over a portion of the surface of a semiconductive substrate;
- b) forming vias in the silicon dioxide layer;
- c) depositing a photoresist layer on the silicon dioxide layer and patterning the photoresist layer to form openings above the vias and larger than the vias;
- d) partially etching through the silicon dioxide layer to form openings in the silicon dioxide layer larger than the vias and removing the photoresist layer;
- e) depositing a metal stop layer over the silicon dioxide layer and at least part of the sidewalls of the vias and openings, said metal being one that will selectively resist chemical-mechanical polishing that will erode silicon dioxide and aluminum;
- f) depositing a layer of aluminum over the metal stop layer so that vias and openings are filled;
- g) chemical-mechanical polishing the aluminum layer down to the metal stop layer;
- and
- h) removing said metal stop layer where not covered by the aluminum layer.
A method of forming aluminum contacts comprising:
- a) providing a silicon dioxide layer;
- b) depositing a metal stop layer over the smooth surface portion of the silicon dioxide layer;
- c) forming vias in the silicon dioxide layer;
- d) depositing a photoresist layer on the silicon dioxide and patterning the layer to form openings above the vias and larger than the vias;
- e) using the patterned photoresist layer as a mask for in turn etching away the metal stop layer, then etching away a partial thickness of the silicon dioxide layer and then removing the photoresist layer;
- f) depositing a layer of aluminum so that vias and openings in the silicon dioxide layer are filled;
- g) chemical-mechanical polishing the aluminum layer down to the metal stop layer, polishing with a slurry that distinguishes between the etch rate of aluminum and that of the stop layer;
- and
- h) removing the remaining metal stop layer.
Dependencies are inferred from the claim text.