Quinonediazide positive photoresist utilizing mixed solvent consisting essentially of 3-methyl-3-methoxy butanol and propylene glycol alkyl ether acetate
AssigneeClariant Finance (BVI) Limited
InventorsStanley F. Wanat, M. Dalil Rahman, Dinesh N. Khanna, Daniel P. Aubin, Sunit S. Dixit
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Abstract
A photosensitive positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming novolak resin; at least one o-diazonaphthoquinone photosensitizer; and a photoresist solvent mixture comprising a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol and process for producing such a composition.
Claims12
A photosensitive positive working photoresist composition, which consists essentially of an admixture of from about 15% to about 99% based on the weight of the solids portion of said composition of at least one water insoluble, aqueous alkali soluble film forming novolak resin;
- from about 1% to about 85% based on the weight of the solids portion of said composition of at least one o-diazonaphthoquinone photosensitizer, and from about 40% to about 90% based on the weight of the overall photosensitive composition of a photoresist solvent composition consisting essentially of a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol, wherein the solvent consists essentially of from about 40% to about 60% by weight of 3-methyl-3-methoxy-butanol and from about 60% to about 40% by weight of propylene glycol alkyl ether acetate.
A process for producing a positive working photoresist composition, which comprises forming an admixture consisting essentially of from about 15% to about 99% based on the weight of the solids portion of said composition of at least one water insoluble, aqueous alkali soluble, film forming novolak resin;
- from about 1% to about 85% based on the weight of the solids portion of said composition of at least one ortho-diazinaphthoquinone photosensitizer;
- and from about 40% to about 90% based on the weight of the overall photosensitive composition of a photoresist solvent consisting essentially of a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy-butanol, wherein the solvent consists essentially of from about 40% to about 60% by weight of 3-methyl-3-methoxy-butanol and from about 60% to about 40% by weight of propylene glycol alkyl ether acetate.
Dependencies are inferred from the claim text.