Drip chemical delivery apparatus
AssigneeOntrak Systems, Inc.
InventorsWilbur C. Krusell, Lane L. Larson
Life of this patent
Estimating the term…
Abstract
A drip chemical delivery system used in semiconductor substrate cleaning processes. A drip chemical delivery system which uses small openings in a pipe (holes) and a low air pressure to saturate the brushes in a double sided brush system. This drip delivery system reduces the volumes of chemical solutions used in a scrubbing process and helps to maintain control of the pH profile of a substrate. This system is described and illustrated in the manner it is used in conjunction with a double sided scrubber.
Claims22
An apparatus for cleaning a substrate comprising:
- a substrate holder;
- a brush to scrub said substrate;
- a drip mechanism to drip a solution on said brush.
An apparatus for cleaning a substrate comprising:
- a substrate holder;
- a brush to scrub said substrate;
- a drip mechanism to drip a solution on said brush, wherein said drip mechanism drips said solution on said brush at a pressure of approximately 5-8 psig.
A double sided scrubber:
- a substrate holder;
- a first brush and a second brush to scrub a substrate;
- a drip mechanism to drip a solution on said first brush and said second brush.
Dependencies are inferred from the claim text.