Three-component chemical amplified photoresist composition

A chemically amplified photoresist composition comprising:

• an alkali soluble resin;
• a dissolution inhibitor which is an aromatic polyhydroxy compound of the following general formula I:
• ##STR7## wherein R.sub.1 and R.sub.2 are independently selected from the group consisting of hydrogen, halogen, an alkyl radical and an alkoxy radical;
• a is an integer of 1 to 3;
• b is an integer of 1 to 8;
• c is an integer of 1 to 12;
• R.sub.3 is an alkoxy radical or an alkoxy radical substituted with an ether group, a mercapto group, a sulfoxide group, a sulfone group, an aryl group or a hydroxyl group;
• R is independent and is at least two of the radicals represented by formulas II-1, II-2, II-3, or II-4:
• ##STR8## and a photo acid generating agent of an onium salt represented by the following general formula III:
• Ar.sub.3 X.sup.+ Y.sup.- (III)
• wherein Ar is any one selected from the group consisting of aromatic hydrocarbons and halogen-substituted aromatic hydrocarbons, x is selected from the group consisting of halogen, sulfur, and selenium, and Y is selected from the group consisting of BF.sub.4, PF.sub.6, AsF.sub.6, SbF.sub.6 and CF.sub.3 SO.sub.3.