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US 5,851,315 AGranted
Process for producing radioisotope source
AssigneeIso-Science Laboratories, Inc.
InventorsGary Strathearn, Seyed K. Taghizadeh
Life of this patent
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Abstract
A process for implanting radioisotope ions into a substrate to create a radioisotope source, utilizing the chemical binding of selected ions to the surface of the substrate. Extraneous material not chemically bound to the substrate is removed and the chemically bound ions are diffused below the surface of the substrate in a non-oxidizing environment.
Claims10
A process for implanting radioactive ions to a substrate having a surface, comprising;
- a. chemically binding selected radioactive ions to the surface of the substrate;
- b. removing extraneous material not chemically bound to the substrate surface;
- and
- c. diffusing the chemically bound radioactive ions below the surface of the substrate in a non-oxidizing environment.
1 more element
Dependencies are inferred from the claim text.