Method for the pre-treatment of a photoresist layer on a substrate surface

A method for the pre-treatment of a photoresist layer formed on the surface of a substrate from an alkali-soluble photoresist composition which comprises the step of:

• bringing, prior to a pattern-wise exposure of the photoresist layer to actinic rays in an area defined for patterning, the photoresist layer on the substrate surface in areas excepting for the area defined for the pattern-wise exposure to actinic rays into contact with an aqueous cleaning solution, which consists essentially of (a) a mixture of water and a water-miscible organic solvent as an aqueous medium, (b) a water-soluble alkaline compound dissolved in the aqueous medium and (c) an anti-corrosion agent, wherein the amount of the anti-corrosion agent in the cleaning solution is in the range from 0.01 to 10% by weight, the amount of the water-miscible organic solvent in the cleaning solution is in the range from 0.05 to 20% by weight, the amount of the water-soluble alkaline compound in the cleaning solution is in the range from 0.05 to 20% by weight, the water-miscible organic solvent in the cleaning solution is selected from the group consisting of monohydric alcohols, alkyl ethers of an alkyleneglycol and aprotic solvents, and said aqueous solution has a surface tension in the range from 40 to 70 dyne/cm at 25.degree. C.