Photosensitive titanium carboxydiketonate and titanium carboxyketoester precursor solutions and method of patterning integrated circuits using the same
AssigneesSymetrix Corporation, Mitsubishi Materials Corporation
InventorsHiroto Uchida, Katsumi Ogi, Nobuyuki Soyama
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Abstract
A photosensitive liquid precursor solution including titanium carboxyketoesters or titanium carboxydiketonates polymerizes upon exposure to ultraviolet radiation. The solution is applied to an integrated circuit substrate, masked, and exposed to ultraviolet radiation to pattern the liquid precursor film. Unexposed portions of the film are removed in a developer solution including alcohol and water. The remaining portion of the film constitutes a pattern that may be annealed to form a metal oxide.
Claims18
A photosensitive device-patterning method for use in making integrated circuits, said method comprising the steps of:
- providing a metal organic liquid solution including
- (A) a metal organic portion including at least one titanium compound selected from the group consisting of titanium carboxydiketonates, titanium carboxyketoesters, and mixtures thereof, and
- (B) a solvent mixed with said metal organic portion in an effective amount for yielding a metal oxide film including metal from said metal organic compound upon application of said metal organic liquid solution to an integrated circuit substrate followed by drying and annealing of said metal organic liquid solution;
- applying said metal organic liquid solution to an integrated circuit substrate to form a film of said metal organic liquid solution;
- and
- exposing said film to a pattern of ultraviolet radiation to make at least a portion of said film resistant to a developer solution capable of dissolving portions of said film not exposed to said ultraviolet radiation.
Dependencies are inferred from the claim text.