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US 5,849,461 AGranted
Chemically amplified positive resist composition
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsJun Hatakeyama, Shigehiro Nagura, Kiyoshi Motomi, Takeshi Nagata, Toshinobu Ishihara
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Abstract
In a chemically amplified positive resist composition comprising an organic solvent, an acid labile group-protected resin and a photoacid generator, a compound having a weight average molecular weight of 100-1,000 and at least two phenolic hydroxyl groups in a molecule wherein the hydrogen atom of the phenolic hydroxyl group is partially replaced by an acid labile group in an overall average proportion of 10-80% is blended as a dissolution controller. The resist composition is highly sensitive to actinic radiation, has improved sensitivity and resolution, and is suitable for use in a fine patterning technique and commercially acceptable.
Claims8
A chemically amplified positive resist composition comprising
- (A) an organic solvent,
- (B) an acid labile group-protected resin which is slightly soluble or insoluble in alkali and becomes alkali soluble by elimination of the acid labile group,
- (C) a dissolution inhibitor,
- (D) a photoacid generator,
- (E) a dissolution controller, said dissolution controller being a compound having a weight average molecular weight of 100 to 1,000 and at least two phenolic groups in a molecule selected from the group consisting of compounds of the following general formulae (1) to (9):
- ##STR28## wherein R.sup.1 and R.sup.2 are independently selected from the group consisting of hydrogen and normal or branched alkyl and alkenyl groups having 1 to 8 carbon atoms,
- R.sup.3 is selected from the group consisting of hydrogen, normal or branched alkyl and alkenyl groups having 1 to 8 carbon atoms, and (R.sup.7).sub.s --COOH,
- R.sup.4 is selected from the group consisting of a group represented by --(CH.sub.2).sub.t -- wherein t is an integer of 2 to 10, arylene group having 6 to 10 carbon atoms, carbonyl group, sulfonyl group, oxygen atom, and sulfur atom,
- R.sup.5 is selected from the group consisting of an alkylene group having 1 to 10 carbon atoms, arylene group having 6 to 10 carbon atoms, carbonyl group, sulfonyl group, oxygen atom, and sulfur atom,
- R.sup.6 is selected from the group consisting of an alkyl group having 1 to 8 carbon atoms, alkenyl group, hydrogen atom, hydroxyl-substituted phenyl and naphthyl groups,
- R.sup.7 is a normal or branched alkylene group having 1 to 10 carbon atoms,
- letter k is an integer of 0 to 5,
- s is 0 or 1.
- m, n, m', n', m", and n" are numbers satisfying m+n=8, m'+n'=5, and m"+n"=4 such that at least one hydroxyl group is attached to each phenyl skeleton, and
- p is such a number of at least 2 as to provide a weight average molecular weight of 100 to 1,000,
- the hydrogen atom of the phenolic hydroxyl group being partially replaced by an acid labile group in an overall average proportion of 10 to 80%.
13 more elements
A chemically amplified positive resist composition comprising:
- (a) an organic solvent;
- (b) an acid labile group-protected resin which is slightly soluble or insoluble in alkali and becomes alkali soluble by elimination of the acid labile group;
- (c) a photoacid generator;
- (d) a dissolution controller, said dissolution controller being a compound having a weight average molecular weight of 100 to 1,000 and at least two phenolic groups in a molecule selected from the group consisting of compounds of the following general formulae (1) to (9):
- ##STR31## wherein R.sup.1 and R.sup.2 are independently selected from the group consisting of hydrogen and normal or branched alkyl and alkenyl groups having 1 to 8 carbon atoms,
- R.sup.3 is selected from the group consisting of hydrogen, normal or branched alkyl and alkenyl groups having 1 to 8 carbon atoms, and (R.sup.7).sub.s --COOH,
- R.sup.4 is selected from the group consisting of a group represented by --(CH.sub.2).sub.1 -- wherein t is an integer of 2 to 10, arylene group having 6 to 10 carbon atoms, carbonyl group, sulfonyl group, oxygen atom, and sulfur atom,
- R.sup.5 is selected from the group consisting of an alkylene group having 1 to 10 carbon atoms, arylene group having 6 to 10 carbon atoms, carbonyl group, sulfonyl group, oxygen atom, and sulfur atom,
- R.sup.6 is selected from the group consisting of an alkyl group having 1 to 8 carbon atoms, alkenyl group, hydrogen atom, hydroxyl-substituted phenyl and naphthyl groups,
- R.sup.7 is a normal, or branched alkylene group having 1 to 10 carbon atoms,
- letter k is an integer of 0 to 5,
- s is 0 or 1,
- m, n, m', n', m", and n" are numbers satisfying m+n=8, m'+n'=5, and m"+n"=4 such that at least one hydroxyl group is attached to each phenyl skeleton, and
- p is such a number of at least 2 as to provide a weight average molecular weight of 100 to 1,000,
- the hydrogen atom of the phenolic hydroxyl group being partially replaced by an acid labile group in an overall average proportion of 10 to 80%.
12 more elements
A chemically amplified positive resist composition comprising:
- (A) an organic solvent,
- (B) an acid labile group-protected resin which is slightly soluble or insoluble in alkali and becomes alkali soluble by elimination of the acid labile group,
- (C) a dissolution inhibitor,
- (D) a photoacid generator,
- (E) a dissolution controller, wherein the dissolution comprises a compound having a weight average molecular weight of 100 to 1,000 and at least two phenolic hydroxyl groups in a molecule, the hydrogen atom of the phenolic hydroxyl group being partially replaced by an acid labile group in an overall average proportion of 10 to 80%.
2 more elements
Dependencies are inferred from the claim text.