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US 5,849,457 AGranted
Positive-working quinonediazide sulfonic acid ester resist composition utilizing solvent system including 2-heptanone, ethyl lactate, and .gamma. -
AssigneeSumitomo Chemical Company, Limited
InventorsKatsuhiko Namba, Kaoru Tatekawa, Hiroshi Moriuma, Yasunori Uetani
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Abstract
A positive-working resist composition comprising (A) a quinonediazide compound, (B) an alkali-soluble resin, and (C) a solvent system comprising 2-heptanone, ethyl lactate and .gamma.-butylactone in which the quinonediazide compound exhibits a very high solubility and which characteristics such as sensitivity, profile and coatability are excellent.
Claims4
A positive-working resist composition comprising
- (A) an effective amount of a quinonediazidesulfonic acid ester of a hydroxybenzophenone compound represented by the following general formula (I) ##STR5## wherein two groups among R1, R2, R3, R4, R5, R6, R7, R8, R9 and R10 represent a hydroxyl group and the others each independently represent a hydrogen atom or a hydroxyl group;
- (B) an effective amount of an alkali-soluble resin;
- and
- (C) an effective amount of a solvent system including 2-heptanone, ethyl lactate and .gamma.-butyrolactone,
- wherein the amount of .gamma.-butyrolactone is 1.0% by weight or more and the amount of ethyl lactate is 10% by weight or more on the basis of the total amount of the solvent system (C).
2 more elements
Dependencies are inferred from the claim text.