Phase shift mask and method for fabricating the same

A phase shift mask, comprising:

• a transparent substrate;
• a light shield film pattern formed directly on said transparent substrate, the light shield film pattern having alternately-arranged lines and spaces having respective desired dimensions;
• a first phase shift film pattern formed directly on said light shield film pattern and provided with alternately-arranged lines and spaces, the first phase shift film pattern having a larger line width than a line width of said light shield film pattern;
• and
• a second phase shift film pattern formed directly on said transparent substrate on a portion of said transparent substrate occupied by the spaces of said first phase shift film pattern, the second phase shift film pattern occupying less than all the spaces of said first phase shift film pattern.

A method for forming a phase shift mask, comprising:

• preparing a transparent substrate;
• forming a first phase shift film pattern directly on said transparent substrate, the first phase shift film pattern having alternately-arranged lines and spaces having respective desired dimensions;
• forming a light shield film pattern directly on the first phase shift film pattern and not directly on the transparent substrate, the light shield film pattern having alternately-arranged lines and spaces in such a manner that said light shield film pattern has a smaller line width than that of said first phase shift film pattern;
• and
• forming a second phase shift film pattern having alternately-arranged lines and spaces having respective desired dimensions directly on said transparent substrate on a portion of said transparent substrate occupied by the spaces of said first phase shift film pattern, the second phase shift film pattern occupying less than all the spaces of said first phase shift film pattern.