X-ray mask blank, X-ray mask and pattern transfer method
AssigneeHoya Corporation
InventorsTsutomu Shoki, Takamitsu Kawahara
Life of this patent
Estimating the term…
Abstract
There is provided an X-ray mask blank from which an X-ray mask having a remarkably small positional deformation even at a large window size of 50 mm square and a remarkably positional precision can be manufactured. The X-mask blank has an X-ray transparent film on a substrate and an X-ray absorber film on the X-ray transparent film. A product of Young modulus and film thickness of the X-ray transparent film is 6.times.10.sup.8 to 3.times.10.sup.9 dyn/cm.
Claims11
An X-ray mask blank comprising:
- (a) a substrate;
- (b) an X-ray transparent film formed on said substrate;
- and
- (c) an X-ray absorber film formed on said X-ray transparent film, wherein
- a product of Young modulus and film thickness of said X-ray transparent film is 6.times.10.sup.8 to 3.times.10.sup.9 dyn/cm.
An X-ray mask comprising:
- (a) a support frame;
- (b) an X-ray transparent film formed on said frame;
- and
- (c) an X-ray absorber pattern film formed on said X-ray transparent film,
- wherein a product of Young modulus and film thickness of said X-ray transparent film is 6.times.10.sup.8 to 3.times.10.sup.9 dyn/cm.
A pattern transfer method comprising the step of transferring a pattern formed on a mask to a receptor by X-ray irradiation, wherein said mask includes:
- (a) a support frame;
- (b)an X-ray transparent film formed on said frame;
- and (c) an X-ray absorber pattern film formed on said X-ray transparent film, wherein a product of Young modulus and film thickness of said X-ray transparent film is 6.times.10.sup.8 to 3.times.10.sup.9 dyn/cm .
Dependencies are inferred from the claim text.