Projection exposure apparatus including a condenser optical system for imaging a secondary light source at positions different in an optical axis direction with respect to two crossing planes

A projection exposure apparatus comprising:

• a projection optical system for projecting a pattern of a first object onto a second object;
• a laser source for emitting laser light;
• an optical integrator for forming a secondary light source by the laser light from said laser source;
• and
• a condenser optical system for illuminating the first object with the light from the secondary light source to project the pattern onto the second object, said condenser optical system having an array of lenses, wherein rear focal positions of said lenses are different with respect to two crossing planes so as to image the secondary light source at positions which are different in a direction of an optical axis of said projection optical system with respect to the two crossing planes, said different Positions both being on a second object side of the first object.

A projection exposure apparatus comprising:

• an illumination optical system for illuminating a first object with light from a laser source;
• and
• a projection optical system for protecting a pattern of the first object onto a second object,
• wherein said illumination system images the light from the laser source at positions which are different in a direction of an optical axis of said projection optical system with respect to two crossing planes, said different positions both being on a second object side of the first object.

A device manufacturing method comprising:

• projecting, using a projection optical system, a pattern of a first object onto a second object;
• emitting laser light from a laser source;
• forming, using an optical integrator, a secondary light source from the laser source;
• and
• illuminating, using a condenser optical system, the first object with the light from the secondary light source to project the pattern onto the second object, the condenser optical system imaging the secondary light source at positions which are different in a direction of an optical axis of the projection optical system with respect to two crossing planes, wherein the different positions are both on a second object side of the first object.

A device manufacturing method comprising:

• projecting, using a projection optical system, a pattern of a first object onto a second object;
• emitting laser light beam from a laser source;
• forming, using an optical integrator, a secondary light source by the laser light from the laser source;
• and
• illuminating, using a condenser optical system, the first object with the light from the secondary light source to project the pattern onto the second object, the condenser optical system having an array of lenses, wherein rear focal positions of the lenses are different with respect to two crossing planes so as to image the secondary light source at positions which are different in a direction of an optical axis of the projection optical system with respect to the two crossing planes, the different positions both being on a second object side of the first object.

A device manufacturing method comprising:

• illuminating, using an illumination optical system, a first object with light from a laser source;
• and
• projecting, using a projection optical system, a pattern of the first object onto a second object,
• wherein the illumination system images the light from the laser source at positions which are different in a direction of an optical axis of the projection optical system with respect to two crossing planes, the different positions both being on a second object side of the first object .