Positive-working radiation-sensitive mixture and production of relief structures
AssigneeBASF SE
InventorsReinhold Schwalm, Dirk Funhoff, Horst Binder
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Abstract
A positive-working radiation-sensitive mixture essentially consists of (a) at least one polymer which contains acid-labile groups and is insoluble in water but becomes soluble in aqueous alkaline solutions as a result of the action of acid, (b) at least one organic compound which produces an acid under the action of actinic radiation and (c) at least one further organic compound differing from (b), where the polymer (a) contains incorporated units of the formulae (I), (II) and (III) ##STR1## and the organic compound (b) is a sulfonium salt of the formula (IV) ##STR2## The radiation-sensitive mixture is suitable for the production of relief structures having improved contrast.
Claims7
A positive-working radiation-sensitive mixture essentially consisting of
- (a) at least one polymer which contains acid-labile groups and is insoluble in water but becomes soluble in aqueous alkaline solutions as a result of the action of acid,
- (b) at least one organic compound which produces an acid under the action of actinic radiation and
- (c) at least one further organic compound differing from (b),
- wherein
- the polymer (a) contains incorporated units of the formulae (I), (II) and (III) ##STR6## with the proviso that 3- 70mol % of units of the formula (I)
- 30-50 mol % of units of the formula (II) and
- 0-15 mol % of units of the formula (III) are present as structural units of the polymer,
- the organic compound (b) is a sulfonium salt of the formula (IV) ##STR7## and the organic compound (c) is of the formula (V) ##STR8## where R' and R" are identical or different and are each alkyl of 1 to 4 carbon atoms, or R' and R" are linked to one another via CH.sub.2 groups to give a five-membered ring, and R'" is alkyl of 1 to 4 carbon atoms.
Dependencies are inferred from the claim text.