Photoresist composition
AssigneeSumitomo Chemical Company, Limited
InventorsNobuhito Fukui, Yuji Ueda, Naoki Takeyama, Takehiro Kusumoto, Yuko Yako, Shigeki Yamamoto
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Abstract
A positive-working photoresist composition which exhibits a high sensitivity and a high resolution in addition to excellent characteristics such as heat resistance, film retention ratio, coatability and profile; which comprises an alkali-soluble resin comprising a polyvinylphenol resin which is polyvinylphenol and/or its partially hydrogenated product in which the phenolic hydroxyl groups are partially alkyletherified and partially protected; and a sulfonate of a N-hydroxyimide compound as an acid generator.
Claims12
A positive-working photoresist composition which comprises:
- an alkali-soluble polyvinylphenol resin which is polyvinylphenol and/or partially hydrogenated polyvinylphenol in which the phenolic hydroxyl groups are partiallyalkyletherified and partially protected by a tert-butoxycarbonylmethyl group;
- a sulfonate of N-hydroxyimide compound as an acid generator;
- and an electron donor having an oxidation-reduction potential of 1.7 eV or less.
Dependencies are inferred from the claim text.