Mask structure and exposure method and apparatus using the same
AssigneeCanon Kabushiki Kaisha
InventorsKeiko Chiba, Takayuki Yagi
Life of this patent
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Abstract
An X-ray mask structure is produced by a procedure including the steps of preparing a substrate having a surface provided thereon with an X-ray transmitting film, forming, on the substrate, one of a metal film and a multilayered film, having alkali resistivity, removing a predetermined limited portion of the metal film, bonding the substrate and a reinforcing member through the remaining metal film, by an anodic bonding process wherein the remaining metal film functions as an electrically conductive material in the anodic bonding process, etching the substrate with the remaining metal film functioning as an etching mask, to define an X-ray transmitting portion of the X-ray transmitting film and forming a mask pattern by use of an X-ray absorptive material.
Claims10
An X-ray mask structure produced by a procedure including the following steps:
- preparing a substrate having a surface provided thereon with an X-ray transmitting film;
- forming, on the substrate, one of a metal film and a multilayered film, having alkali resistivity;
- removing a predetermined limited portion of the metal film;
- bonding the substrate and a reinforcing member through the remaining metal film, by an anodic bonding process wherein the remaining metal film functions as an electrically conductive material in the anodic bonding process;
- etching the substrate with the remaining metal film functioning as an etching mask, to define an X-ray transmitting portion of the X-ray transmitting film;
- and
- forming a mask pattern by use of an X-ray absorptive material.
Dependencies are inferred from the claim text.