Semiconductor furnace processing vessel base
AssigneeSemitool, Inc.
InventorRobert A. Weaver
Life of this patent
Estimating the term…
Abstract
A vertically oriented thermal processor supports semiconductor wafers within a vertical process chamber within a process tube about which a furnace heater is supported. A base plate support assembly mates with a processing vessel such that the interior surface in proximate fluid adjoining relation with the processing chamber is formed from substantially-inert materials. Additionally, the base plate support assembly includes fluid cooling features that protect seals formed by devices passing through the base plate assembly into the processing chamber for delivery of processing gases and monitoring of thermal conditions therein. Additionally, cooling features are provided in a base plate in order to prevent components from becoming heat sinks or heat sources in relation to the processing chamber.
Claims25
A base plate assembly for use in supporting and mating with a processing vessel and a semiconductor furnace of a vertical thermal processor, comprising:
- a base plate member having a top face constructed and arranged to mate in engagement with an open bottom face of the processing vessel;
- and
- a base support having a top support face configured to positionally support the base plate member in the furnace for sealable engagement with the processing vessel, the base plate member configured in relation to the base support so as to define a cooling cavity therebetween;
- wherein a flow of cooling fluid is delivered through the cooling cavity so as to thermally regulate the base plate in proximate fluid adjoining relation with a processing chamber within the processing vessel.
Dependencies are inferred from the claim text.