Developing method

A developing method for developing photoresist coated on a substrate with developing solution comprising the steps of:

• (a) keeping the substrate substantially horizontally such that a resist-coated surface is placed at a top portion;
• (b) starting a rotation of the substrate at a first rotation speed N1, starting discharging developing solution from a nozzle at a position where the substrate is prevented from being applied thereon during the rotation of the substrate, and starting scan-moving the nozzle along the substrate as discharging developing solution;
• (c) starting a first deceleration for decelerating the rotation of the substrate while the nozzle is scan-moving;
• (d) stopping the scan-movement of the nozzle above a central area of the substrate when the rotation of the substrate reaches a second rotation speed N2;
• (e) ending the first deceleration when the rotation of the substrate reaches a third rotation speed N3;
• and
• (f) starting a second deceleration for decelerating the rotation of the substrate from the third rotation speed N3 to a fourth rotation speed N4 after rotating the substrate at the third rotation speed N3, ending the second deceleration when the rotation of the substrate reaches at the fourth rotation speed N4, and supplying developing solution onto the substrate while the substrate is being rotated at the fourth rotation speed N4 such that a liquid film of developing solution having substantially a uniform thickness is formed on the substrate to develop the resist coated on the substrate.