US 5,843,602 A · Method of adjusting concentration of developer through load cell utilization and wet nitrogen gas atmosphere

Abstract

The concentration of a developer for use in developing resists in the fabrication of integrated circuits of semiconductors is adjusted highly accurately using a load cell. A stock developer and pure water are supplied to a mixing tank supported on a load cell, and mixed into a diluted developer in the mixing tank. The concentration of the diluted developer from the mixing tank is analyzed by an automatic analyzer, which then calculates the weight of a stock developer or pure water to be introduced into the mixing tank based on the analyzed concentration in order to achieve a predetermined concentration. Then, either a stock developer or pure water of the calculated weight is supplied to the mixing tank until the weight, as measured by the load cell, of the mixing tank containing the stock developer and the pure water is increased by the calculated weight. Thereafter, the diluted developer is transferred from the mixing tank to a reservoir tank, while both tanks are maintained under a nitrogen gas atmosphere.

Claims13

Dependent claims

A method of adjusting the concentration of a developer, comprising:

supplying a nitrogen gas atmosphere through a bubbling tank to a mixing tank and a reservoir tank and maintaining a wet nitrogen gas atmosphere in said mixing and reservoir tanks;
supplying a stock developer and pure water to said mixing tank supported on a load cell;
mixing the stock developer and the pure water into a diluted developer in said mixing tank;
analyzing the concentration of the diluted developer contained in said mixing tank;
calculating a weight of a stock developer or pure water to be introduced into said mixing tank based on the analyzed concentration in order to achieve a predetermined concentration;
supplying either said stock developer or pure water to said mixing tank until a weight, as measured by said load cell, of the mixing tank containing the stock developer and the pure water is increased by the calculated weight, said stock developer or said pure water being supplied to said mixing tank at a higher rate and then at a lower rate until a predetermined amount of the stock developer or pure water is introduced into said mixing tank;
and
thereafter transferring the diluted developer from the mixing tank to said reservoir tank.

5 more elements

A method for generating a ready supply of diluted developer at a highly accurate concentration, comprising the steps of:

supplying a nitrogen gas atmosphere through a bubbling tank to a mixing tank and a reservoir tank and maintaining a wet nitrogen gas atmosphere in said mixing and reservoir tanks;
supplying an approximate amount of stock developer and an approximate amount of diluent to said mixing tank;
mixing said stock developer and diluent into a diluted developer in said mixing tank;
monitoring a weight of said diluted developer in said mixing tank using a load cell;
determining an initial concentration of said diluted developer;
calculating an amount of at least one of said stock developer and said diluent to be introduced into said mixing tank based on the determined initial concentration of said diluted developer and a predetermined desired concentration of diluted developer;
supplying an additional amount of at least one of said stock developer and said diluent to said mixing tank until the monitored weight of said diluted developer is increased by said calculated amount;
said stock developer and said diluent being supplied at higher rates and then at lower rates until predetermined amounts thereof are introduced into said mixing tank;
and
thereafter transferring the diluted developer from the mixing tank to said reservoir tank as a ready supply of diluted developer.

7 more elements

Dependencies are inferred from the claim text.

Method of adjusting concentration of developer through load cell utilization and wet nitrogen gas atmosphere

Life of this patent

Method of adjusting concentration of developer through load cell utilization and wet nitrogen gas atmosphere

Life of this patent

Abstract

Claims13