Photosensitive material processing apparatus

A photosensitive material processing apparatus which includes a processing tank having a solution introduction port provided in the bottom wall thereof, and a rack disposed within the processing tank, wherein said rack comprises:

• first and second rack parts which are joined together to form a sidewall of said rack and to form a duct therebetween;
• and
• third and fourth rack parts which are joined together to form a bottom portion of said rack and to form a duct therebetween;
• wherein:
• said ducts are connected to said solution introduction port of the processing tank so as to receive a processing solution;
• one of said first and second rack parts which forms a transport path for a photosensitive material is provided with slits for jetting the processing solution;
• said rack further comprises solution exits, formed in one of said first and second rack parts and adjacent to said slits, which allow the processing solution to flow out from said rack via the transport path;
• said first rack part is a rack plate which faces the transport path and has said slits;
• said second rack part is a back plate attached to the back of said rack plate so as to form a duct;
• said third rack part is a turn guide for changing the direction of transportation of the photosensitive material;
• said fourth rack part is a turn cover which is attached to said turn guide so as to form a duct;
• and
• said first and second rack parts are provided on either of an inlet side of said rack where the photosensitive material is transported downward and an outlet side of said rack where the photosensitive material is transported upward, and each of slits provided on the inlet side has a V-like shape, while each of slits provided on the outlet side has an inverted-V-like shape.