Processing apparatus and processing method
AssigneeTokyo Electron Limited
InventorsMitsuhiro Sakai, Masafumi Nomura, Kazuaki Tsunoda
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Abstract
A development processing apparatus includes a processing unit for storing a substrate S and a processing solution supply nozzle arranged above the substrate S stored in the processing unit. A processing solution storage is formed inside the supply nozzle. A supply passage for supplying the processing solution into the solution storage is connected to the supply nozzle. A plurality of eject holes for ejecting the processing solution in the solution storage are formed in a lower surface of the supply nozzle. In this processing apparatus, the upper surface of the solution storage consists of at least one inclined surface, and an exhaust port is formed in a high portion of the inclined surface.
Claims30
A processing apparatus comprising:
- a processing unit for containing a substrate;
- a processing solution supply nozzle arranged above the substrate;
- a processing solution storage formed inside said supply nozzle and having an upper surface consisting of at least one inclined surface;
- a supply passage for supplying a solution into said solution storage;
- a plurality of eject holes formed in a lower surface of said supply nozzle to eject the processing solution in said solution storage;
- and
- an exhaust port formed in a high portion of said inclined surface of said solution storage.
A processing apparatus comprising:
- a processing unit for storing a substrate;
- a processing solution supply nozzle arranged above the substrate;
- a processing solution storage formed inside said supply nozzle;
- a supply passage for supplying a processing solution into said solution storage;
- a plurality of eject holes formed in a lower surface of said supply nozzle to eject the processing solution in said solution storage;
- an exhaust port for exhausting air from said solution storage to the outside;
- and
- a guide member for dispersing a flow of the processing solution supplied from said supply passage into said solution storage.
A processing method of processing a substrate by supplying a processing solution to a surface of the substrate, comprising the steps of:
- supplying the processing solution to a solution storage formed in a supply nozzle and ejecting the processing solution in said solution storage from a plurality of eject holes formed in a lower surface of said supply nozzle, thereby supplying the processing solution on a surface of a substrate;
- and
- exhausting air from said solution storage through an exhaust port formed in said supply nozzle.
Dependencies are inferred from the claim text.