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US 5,776,652 AGranted
Aromatic hexafluoropropanesulfonate diazonium salts and their use in radiation-sensitive mixtures
AssigneeAgfa-Gevaert
InventorsMathias Eichhorn, Gerhard Buhr
Life of this patent
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Abstract
The invention relates to aromatic or heteroaromatic mono- or bis-diazonium 1,1,2,3,3,3-hexafluoro-propanesulfonates. They are employed in positive-working or negative-working radiation-sensitive mixtures which are used for coating radiation-sensitive recording material.
Claims22
A radiation-sensitive mixture which contains
- a) a compound which forms acid on exposure to actinic radiation,
- b.sup.1) for a positive-working mixture, a compound whose solubility in aqueous alkaline solution increases on exposure to the radiation or the acid, or
- b.sup.2) for a negative-working mixture, a compound whose solubility in aqueous alkaline solution decreases on exposure to the acid,
- c) wherein the compound a) is an aromatic or heteroaromaticmono- or bisdiazonium 1,1,2,3,3,3-hexafluoropropanesulfonate.
1 more element
The radiation-sensitive mixture as claimed in claim 23, wherein the compound a) is a benzenediazonium 1,1,2,3,3,3-hexafluoropropanesulfonate or a fluorenediazonium 1,1,2,3,3,3-hexafluoropropanesulfonate.
Dependencies are inferred from the claim text.