Heat treatment apparatus and method
AssigneeTokyo Electron Limited
InventorWataru Ohkase
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Abstract
A heat treatment apparatus comprising heat rays radiating means having a sheet-like heat rays radiating section, a process tube radiated and heated by heat rays shot from the sheet-like heat rays radiating section, and means for carrying a substrate, which has a surface of a semiconductor film and/or a dielectric film to be treated, into and out of the process tube, wherein said substrate is positioned to the sheet-like heat rays radiating section in the process tube in such a way that the incident angle of heat rays onto the peripheral portion of the treated surface of said substrate becomes smaller than 60.degree., so that heat rays absorptivity at the peripheral portion of said surface can be increased.
Claims4
A heat treatment apparatus provided with a ring or spiral resistant heating unit supported by an insulator block and arranged around a process tube of the vertical type, wherein said insulator block has plural ring piece members piled upon one another, and wherein two adjacent ring piece members form a space in which a portion of said resistant heating unit is housed, and said space has an opening opposed to said process tube of the vertical type.
Dependencies are inferred from the claim text.