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US 5,708,267 AGranted
Processing method using fast atom beam
AssigneeEbara Corporation
InventorMasahiro Hatakeyama
Life of this patent
Estimating the term…
Abstract
A processing method using a fast atom beam wherein a surface of a substrate to be processed is covered with a masking member formed with patterned holes and the masking member is irradiated with the fast atom beam from a fast atom beam generator so that substrate is processed by the fast atom beam applied to the surface of the substrate through the patterned holes of the masking member.
Claims12
A processing method comprising the step of:
- covering a surface of an object to be processed with a non-fixed movable masking member formed with a hole with a pattern therein in contact with or with a predetermined gap closely spaced from said surface of said object, and
- irradiating said masking member with a fast atom beam of neutrally charged atoms or molecules that have a kinetic energy above several eV so that said object is processed by said fast atom beam applied to the surface of said object through the hole in said masking member to create said pattern on said object.
Dependencies are inferred from the claim text.