Method for producing thin film multilayer wiring board
AssigneeHitachi, Ltd.
InventorsJunichi Katagiri, Akio Takahashi, Akira Nagai, Haruo Akahoshi, Kouji Fujisaki, Akio Mukoh, Fumiyuki Kobayashi
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AssigneeHitachi, Ltd.
InventorsJunichi Katagiri, Akio Takahashi, Akira Nagai, Haruo Akahoshi, Kouji Fujisaki, Akio Mukoh, Fumiyuki Kobayashi
Estimating the term…
A thin film multilayer wiring material excellent in reliability, yield, productivity, and higher positioning accuracy includes an insulation organic film having a wiring pattern on one surface and an adhesive layer on another principal surface. The insulation organic film is a polyimide film having a heat resistance at a pyrolysis beginning temperature of 350.degree. to 550.degree. C., a dielectric constant of 3.5-2.2 and a flame retardance of V-0 or V-1 according to the UL-94 standard. The adhesive layer contains an ether bismaleimide compound.
A thin film multilayer wiring material which comprises an insulation organic film having a wiring pattern layer on one principal surface and an adhesive layer on another principal surface;
Dependencies are inferred from the claim text.