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US 5,707,686 AGranted
Method for preventing moisture from being absorbed into impurity-contained insulating layer
AssigneeHyundai Electronics Industries Co., Ltd.
InventorSahng Kyoo Lee
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Abstract
A method for preventing moisture from being absorbed into an impurity-contained insulating layer is disclosed, including the steps of: forming an impurity-contained insulating layer on a substrate; and coating a material of an alcohol group on the impurity-contained insulating layer, to form an alcohol film.
Claims3
A method for preventing moisture from being absorbed into an insulating layer of a semiconductor device containing impurities, comprising the steps of:
- forming a glass containing boron and/or phosphorous containing insulating layer on a substrate of a semiconductor device;
- and
- coating an alcohol on said impurity-containing insulating layer, to form an alcohol film,
- wherein said alcohol is a member selected from the group consisting of ethyl alcohol, isopropyl alcohol and methyl alcohol.
1 more element
Dependencies are inferred from the claim text.